• Technical Conference:  30 March – 03 April 2025
  • Exhibition: 01 – 03 April 2025
  • Moscone Center, San Francisco, California, USA

Current State and Future of Thin-Film Lithium Niobate Photonics

Thursday, 28 March, 14:45 – 15:45

Theater III

Session Description:

The panel discussion will address technical status updates and ongoing developments related to Thin-Film Lithium Niobate (TFLN) photonics. Over the past years, TFLN has transitioned from a research-centered new material platform to becoming a strong candidate to provide practical solutions for next generation applications. In particular datacom, telecom and high-performance applications such as radio-over-fiber and measurement and test can benefit from TFLN attributes such as ultra-high electro-optic bandwidths, low driving voltages, compact size and cost effective production.


Presented By



Marko Loncar, Harvard University, United States


Andy Bechtolsheim, Arista Networks, Germany

Xinlun Cai, Liobate, Taiwan

Shuntaro Makino, Fujitsu Optical Components, Japan

Ed Preisler, Tower Semiconductor, United States

Christian Reimer, HyperLight, Germany