17 March 2026
Enlitech Launches Night Jar for CPO & AI Optical Yield Tracking
Enlitech is showcasing its latest Night Jar™ Silicon Photonics Wafer Test System at OFC 2026 (Booth 5055), providing a full-lifecycle optical yield tracking solution for silicon photonics chips—from design to packaging. The system supports O-to-O (Optical to Optical) loss measurement and can seamlessly integrate with existing automated probe stations, enabling wafer-level optical loss mapping as well as qualitative and quantitative defect analysis.
Night Jar™ combines hyperspectral imaging with optical power quantification, supporting WAT, CP. It enables rapid scanning of wafer optical hotspots and precise defect localization, helping engineers quickly assess chip yield and process stability. For complex photonic devices such as MZI, AWG, and SiN waveguides, the system transforms traditional “black-box” measurements into spatially resolved quantitative images, feeding back valuable data for PDK modeling and process optimization.
Enlitech emphasizes that Night Jar™ not only enhances wafer testing efficiency but also provides a comprehensive solution for pre-packaging risk assessment, failure analysis, and production yield management. With this platform, Night Jar™ is poised to become a new standard in silicon photonics chip testing. Visitors are invited to Booth 5055 to experience the system and explore its practical applications.