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PRESS RELEASE

07 March 2024

Contact:

Kelsey Wooley / Rene Wilde
Kelsey.Wooley@Eulitha.com / Rene.Wilde@Eulitha.com
www.Eulitha.com
US: +1 425 236 0795

Eulitha’s DTL patterning offers low-cost, high-precision optical lithography for manufacturing of DFB, VCSEL, PCSEL lasers and telecom gratings

Würenlos, Switzerland, March 7, 2024 - Eulitha’s Displacement Talbot Lithography (DTL) technology is the perfect solution for photonic applications requiring periodic patterning such as Vertical Cavity Surface-Emitting Lasers (VCSEL), Photonic Crystal Surface-Emitting Lasers (PCSEL), Distributed Feedback lasers (DFB) and telecom and WSS gratings.

DTL is a non-contact, optical lithography offering a practical blend of precision patterning and low-cost scalability for nanofabrication. With a substantial 140x140mm2 exposure field, an extensive depth of focus (100s of microns), and the capability to pattern high-resolution 1D and 2D structures, DTL presents a reliable solution to the evolving needs of diverse photonic markets.

This technology has many advantages; such as seamless device exposures within the large exposure field, ability to pattern on non-planar substrates, and mask-locked design control, ensuring pitch accuracy down to an extraordinary 2 picometers. Tools are available in UV or DUV resolutions, around 60nm minimum half pitch. Eulitha offers customizable platforms, ranging from research-focused manual tools to high-volume production systems.

Leveraging the semiconductor industry's maturity, DTL integrates seamlessly with industry-standard masks, resists, and downstream processing methods, ensuring compatibility and ease of adoption into existing manufacturing.

Eulitha is not just a lithography equipment provider, but a solutions partner. The company's team of experts collaborates closely with customers, tailoring patterning solutions to meet unique product specifications. Eulitha’s DTL tools offer a cost-effective and scalable solution capable of meeting the photonic market’s patterning requirements.

VCSEL cell patterning with DTL: 280nm pitch with 22um circular patten