Thursday, 28 March,
14:45
–
15:45
Theater III
Session Description:
The panel discussion will address technical status updates and ongoing developments related to Thin-Film Lithium Niobate (TFLN) photonics. Over the past years, TFLN has transitioned from a research-centered new material platform to becoming a strong candidate to provide practical solutions for next generation applications. In particular datacom, telecom and high-performance applications such as radio-over-fiber and measurement and test can benefit from TFLN attributes such as ultra-high electro-optic bandwidths, low driving voltages, compact size and cost effective production.
Presented By
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Moderator
Marko Loncar, Harvard University, United States
Panelists
Andy Bechtolsheim, Arista Networks, Germany
Xinlun Cai, Liobate, Taiwan
Shuntaro Makino, Fujitsu Optical Components, Japan
Ed Preisler, Tower Semiconductor, United States
Christian Reimer, HyperLight, Germany