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Broadband Polarization Beam Splitters Based on MMI Couplers With Internal Photonic Crystals Fabricated Using 193 nm Photolithography (W6A.46)

Presenter: Luhua Xu, McGill University

We demonstrate a silicon photonic MMI-coupler-based polarization beam splitter, fabricated using 193 nm photolithography. Measured extinction ratios beyond 30 dB and insertion losses below 3 dB are achieved over a record bandwidth of 111 nm.

Authors:Luhua Xu, McGill University / Deng Mao, McGill University / Jinsong Zhang, McGill University / Yun Wang, McGill University / Zhenping Xing, McGill University / Md Samiul Alam, McGill University / Maxime Jacques, McGill University / Yannick D’Mello, McGill University / Santiago Bernal, McGill University / David Plant, McGill University


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